200 mm & 300 mm Fab Services
200 mm & 300 mm Fab Services

Cleanroom Equipment Evaluation

Optimization and qualification of new equipment, parts and consumables for industrial mass production.

Cleanroom Equipment Evaluation for Mass Production

300 mm Screening Fab Services

Timelapse of a tool installation in 300 mm cleanroom at Fraunhofer IPMS - Center Nanoelectronic Technologies (CNT)

The Fraunhofer Screening Fab serves as a platform for tests and evaluation of new equipment, materials and processes under industry standard conditions. All necessary connections and consumables for 200/300 mm wafer processing tools are available in our two clean rooms (see below).

We provide a professional tool and wafer handling (ISO 9001 certified), over 10 years experience in semiconductor research and development and close cooperations with the industry. Furthermore the Fraunhofer IP management guarantees legal compliance for our customers.

Our Fraunhofer IPMS cleanrooms:

200 mm MEMS

  • MEMS Technologies Dresden: 1500 m² cleanroom (class 4 according to ISO 14644-1)
  • Technology development up to pilot production of innovative microsystems on 200 mm 
  • Micro-electro-mechanical systems (MEMS) and micro-opto-electro-mechanical systems (MOEMS)

 

300 mm CMOS

  • 2700 m² class 6 and 3 clean room (according to ISO 14644-1)
  • Development services on 300mm wafers in the area of FEoL and BEoL 
  • Services on ultra large scale integration level 
  • Analytics, Metrology & Characterization

Example: European Semiconductor Metrology Technology Hub with Applied Materials

© Fraunhofer IPMS
Applied Materials’ eBeam metrology equipment at cleanroom of Fraunhofer IPMS.
  • The new hub will provide state-of-the-art metrology systems to accelerate semiconductor research and enhance development projects with chipmakers and ecosystem partners across Europe, particularly in ICAPS* market segments. 
  • Collaboration to accelerate learning, develop novel methods and prove new metrology equipment, methods, algorithms and software

Applied Materials, Inc., the leader in materials engineering solutions, and the Fraunhofer Institute for Photonic Microsystems IPMS, Germany's leading advanced 300mm semiconductor research center, have launched a landmark collaboration to create Europe's largest technology hub for semiconductor metrology and process analysis.

This is located in the 300 mm clean room of Fraunhofer IPMS in Dresden, the technology hub is situated in the heart of Silicon Saxony, Europe’s largest semiconductor cluster. The hub is equipped with Applied Materials’ state-of-the-art eBeam metrology equipment, including its VeritySEM® CD-SEM (critical dimension scanning electron microscope) systems, and staffed by Applied engineers and R&D experts.

Fraunhofer IPMS and its partners benefit from access to Applied’s industry-leading eBeam metrology systems. The new technology hub offers advanced wafer-level metrology in our industrial CMOS environment with Fraunhofer IPMS’s unique ability to loop wafers directly with semiconductor manufacturers.

The collaborative metrology hub will accelerate learning cycles and the development of new applications for Fraunhofer IPMS, Applied Materials and their customers and partners in Europe. This unique technology hub will have the capability to test and qualify processes on a variety of substrate materials and wafer thicknesses critical to applications across the diverse European semiconductor landscape.

Metrology is crucial in the production of microchips as it enables the accurate measurements needed to precisely monitor and control the quality of individual semiconductor manufacturing steps and sequences. Chipmakers use metrology equipment at critical points to help validate physical and electrical characteristics and maintain target yields.

 

*ICAPS = Internet of things, Communications, Automotive, Power and Sensors 

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